Description
Product Name: Jcp200 Magnetron Sputtering Coating Equipment Model NO.: JCP200 Trademark: Technnol Transport Package: Wood Specification: Customize Origin: China HS Code: 8479899990 Product Description Features:1. Dual-use sputtering and evaporation function, less occupied area, competitive price, stable performance and low maintenance costs;2. Can be used for the preparation of single and multi-layer metal film, dielectric film, semiconductor film, magnetic film, sensor film, heat-resistant alloy film, hard film, corrosion-resistant film, etc.;3. Coating samples: silver, aluminum, copper, nickel, chromium, nickel-chromium alloy, titanium oxide, ITO, silica, etc.;4. Single target sputtering, multi-target sputtering in turns, multi-target sputtering simultaneously and so on functions.Application: It is widely used in the research and small batch preparation of new film materials for colleges & universities, research institutes and enterprises.Technical Parameters:Equipment NameMagnetron Sputtering SystemModelJCP200Chamber StructureVertical top cover structure, bottom pumping system, manual pneumatic spring pull open typeChamber SizeΦ210×H310mmBaking TemperatureRoom temperature to 350ºC (662ºF)Sputtering PathUpwardRotating Substrate HolderΦ100mmFilm Thickness NonuniformityWithin the scope of Φ50mm≤±5.0%Sputtering Target / Evaporation Electrode1 Pc of Φ2 Inches magnetron target, reserved 1 group of evaporation electrode interfaceProcess Gas1-2 Routes gas flow controlControl MethodPLC Control / IPC automatic control (optional)Occupied Area(Mainframe) L600×W800×H1700mmPower≥7Kw
